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Posted Mon April 01, 2002 @02:20PM
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CFDRC, world
leader in computational fluid dynamics and plasma simulations, announces the release of CFD-PLASMA-2002, a comprehensive software tool for plasma engineering.
CFD-PLASMA-2002 offers:
Comprehensive fluid model for 3D simulations of Inductively Coupled
Plasmas (ICP), Capacitively Coupled Plasmas (CCP) and direct current (DC)
discharges for a variety of applications that include pulsed, atmospheric
and multi-frequency discharges
Full 3D Maxwell solver and advanced Filament model for simulations of
electromagnetic fields in complex coil configurations in time and frequency
domains
Deterministic Boltzmann solver for simulations of non-local Electron
Energy Distribution Functions (EEDF) and electron induced reaction rates
Enhanced Chemistry Models and Expanded Database for Gas Mixtures commonly
used in Semiconductor Manufacturing
Interface to feature scale simulators SPEEDIE and EVOLVE for semiconductor
manufacturing applications
Expanded set of eight tutorials and a dozen of demonstration problems for
a variety of applications including semiconductor manufacturing, lighting,
feature scale etch, multi-frequency CCP, Plasma Display Panels, and thermal
plasmas (arcs & torches)
Interface to Matematica 4 -for advanced analysis and post-processing of
results
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